Generic names | Postive-type photoresist developer, tetramethylammonium hydroxide (TMAH) |
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Product name | SD-1, SD-W, SD-20, SD-25, Special Developer |
Main applications | Various kinds of resist developers; alkali solvents for electronic devices and other items |
Packing / shipping method | Canisters, drums, polyethylene bottles |
Chemical formula | N(CH3)4OH |
Special properties | Strong alkali; colorless and transparent liquid (at room temperature) |
SD-1
(18L Canisters)
Tokuyama's postive-type photoresist developer SD Series are chemical agents used in photolithography processes to form circuits in semiconductor wafers. They are suitable for micro-processing because that can be used to create sharp wiring patterns. Because SD Series are organic alkaline solution, they can also be used as substitutes for inorganic alkaline developer.
Positive-type photoresist developer is used in the photolithography process for forming patterns, or circuits, on semiconductor wafers. Photoresist (light-sensitive material) is first coated on the surface of the wafer, and then patterns are burned in through light exposure. After the exposure, the photoresist is dissolved using SD-1 to leave the wiring patterns formed. (See the illustration below.)
Grade name | Description |
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SD-1 | Standard type (2.38%) |
SD-W | Surfactant is added (2.38%) |
SD-20 | Conc. product (20%) |
SD-25 | Conc. product (25%) |
Special developer | Special concentrations other than standard type (2.38%) |
Classified as a strong alkali substance with corrosive properties