Positive-Type Photoresist Developer

Tokuyama's postive-type photoresist developer "SD Series" are chemical agents used in photolithography processes (development) to form circuits in semiconductor wafers. The SD series is comprised of high-purity products with very few impurities such as metal ions and chlorine ions. These series are suitable for micro-processing because they can be used to create sharp circuit patterns.
Because "SD Series" are a strong organic alkaline solution, they can also be used as substitutes for an inorganic alkaline solution.
Tokuyama has shipping bases in Japan, Taiwan, Singapore, and China, and is strengthening its supply system to state-of-the-art semiconductor manufacturers.

Product overview

Generic names Postive-type photoresist developer,Tetramethylammonium hydroxide (TMAH)
Chemical formula N(CH3)4OH
Packing /
shipping method
Canisters, chemical drums, polyethylene cans
Grade name Description
SD-1 Surfactant is added (2.38%)
SD-20 Conc. product (20%)
SD-25 Conc. product (25%)
Special developer Special concentrations other than standard type (2.38%)
General applications
  • Photolithography process of various kinds of positive type photoresist (Photolithography process, see the illustration below.)
  • Alkaline cleansers for electronic devices and other items
  • Silicon etching agents for micro-electro-mechanical systems (MEMS)
  • Materials for chemical-mechanical polishing (CMP) slurry
Caution Classified as a strong alkali substance with corrosive properties.

Photolithography process

* Development of various kind of resist
Positive-type photoresist developer is used in the photolithography process(development) for forming patterns, or circuits, on semiconductor wafers. Photoresist (light-sensitive material) is first coated on the surface of the wafer, and then patterns are etched through light exposure from above. After the exposure, the photoresist is dissolved using TMAH(SD series) to leave the circuit patterns formed.

Special characteristics

  • High purity
    Extremely low amount of impurities such as metal ions and chlorine ions.
  • Applicable to micro-processing
    Sharp wiring patterns for easy etching
  • Strong alkali
    Colorless and transparent liquid (at room temperature)